Production of helicon wave-excited plasma and application to sputter deposition

[目次]

  • Contents
  • Chapter1. General Introduction / p1
  • 1.1 Background / p1
  • 1.2 Objective of the research / p6
  • 1.3 Content of the research / p7
  • References / p9
  • Chapter2. Properties of Helicon Wave-Excited Plasmas / p12
  • 2.1 Introduction / p12
  • 2.2 Experimental / p12
  • 2.3 Results and discussion / p15
  • 2.4 Summary / p39
  • References / p41
  • Chapter3. Measurement of Electromagnetic Wave Field / p43
  • 3.1 Introduction / p43
  • 3.2 Experimental / p45
  • 3.3 Results and discussion / p47
  • 3.4 Summary / p55
  • References / p58
  • Chapter4. Application of Helicon Wave-Excited Plasma to DC Sputtering / p59
  • 4.1 Introduction / p59
  • 4.2 Experimental / p61
  • 4.3 Results and discussion / p61
  • 4.4 Summary / p70
  • References / p72
  • Chapter5. Synthesis of Carbon Nitride Films with DC Sputtering Assisted by Helicon Wave-Excited Plasma / p73
  • 5.1 Introduction / p73
  • 5.2 Experimental / p73
  • 5.3 Results and discussion / p77
  • 5.5 Summary / p94
  • References / p96
  • Chapter6. Conclusions / p99
  • Acknowledgement / p101
  • List of Publications / p103

「国立国会図書館デジタルコレクション」より

この本の情報

書名 Production of helicon wave-excited plasma and application to sputter deposition
著作者等 張 津秋
書名別名 ヘリコン波励起プラズマの生成とスパッタリングへの応用
この本を: 
このエントリーをはてなブックマークに追加

このページを印刷

外部サイトで検索

この本と繋がる本を検索

ウィキペディアから連想